TY - JOUR
T1 - Rapid nondestructive method for measuring the refractive index and thickness of thin dielectric films
AU - Raif, J.
AU - Ben-Yosef, N.
AU - Oron, M.
PY - 1973
Y1 - 1973
N2 - Refractive indices of dielectric films, measured by a modified Abeles method, are used for obtaining the film thickness by employing a new interferometric method based on polychromatic optical thickness fringes. Transparent films, ranging in thickness from a few hundred angstroms to a few micrometres, are suitable for measurement by the new technique with accuracies of about 1%. The relatively simple and inexpensive apparatus is amenable to computer control or other modes of automation, providing rapid and nondestructive measurements at a high rate of repetition. The new technique may, therefore, find extensive use not only in research laboratories, but also in industries based on thin film technology, especially in the field of microelectronics.
AB - Refractive indices of dielectric films, measured by a modified Abeles method, are used for obtaining the film thickness by employing a new interferometric method based on polychromatic optical thickness fringes. Transparent films, ranging in thickness from a few hundred angstroms to a few micrometres, are suitable for measurement by the new technique with accuracies of about 1%. The relatively simple and inexpensive apparatus is amenable to computer control or other modes of automation, providing rapid and nondestructive measurements at a high rate of repetition. The new technique may, therefore, find extensive use not only in research laboratories, but also in industries based on thin film technology, especially in the field of microelectronics.
UR - http://www.scopus.com/inward/record.url?scp=36149060949&partnerID=8YFLogxK
U2 - 10.1088/0022-3735/6/1/022
DO - 10.1088/0022-3735/6/1/022
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AN - SCOPUS:36149060949
SN - 0022-3735
VL - 6
SP - 48
EP - 50
JO - Journal of Physics E: Scientific Instruments
JF - Journal of Physics E: Scientific Instruments
IS - 1
M1 - 022
ER -