Refractive index engineering by fast ion implantations: A generic method for constructing multi-components electro-optical circuits

Aharon J. Agranat, Alexander Gumennik, Harel Ilan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

11 Scopus citations

Abstract

Refractive index engineering (RI-Eng) by ion implantations is a generic methodology for constructing multi-component integrated circuits of electrooptic and nanophotonic devices with sub-wavelength features operating in the visible - near IR wavelengths. The essence of the method is to perform spatially selective implantations for sculpting complex 3D pre-designed amorphized patterns with sub-wavelength features and reduced refractive index within the volume of the substrate. A number of devices that were constructed in a substrate of potassium lithium tantalate niobate are described, including a submerged slab waveguide, an optical wire and a channel waveguide array.

Original languageAmerican English
Title of host publicationIntegrated Optics
Subtitle of host publicationDevices, Materials, and Technologies XIV
DOIs
StatePublished - 2010
EventIntegrated Optics: Devices, Materials, and Technologies XIV - San Francisco, CA, United States
Duration: 25 Jan 201027 Jan 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7604
ISSN (Print)0277-786X

Conference

ConferenceIntegrated Optics: Devices, Materials, and Technologies XIV
Country/TerritoryUnited States
CitySan Francisco, CA
Period25/01/1027/01/10

Keywords

  • Electrooptical materials
  • Ferroelectric materials
  • Integrated optoelectronic circuits
  • Ion implantation
  • KLTN
  • Microstructure fabrication

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