Replenish and relax: Explaining logarithmic annealing in ion-implanted c-Si

Laurent Karim Béland*, Yonathan Anahory, Dries Smeets, Matthieu Guihard, Peter Brommer, Jean François Joly, Jean Christophe Pothier, Laurent J. Lewis, Normand Mousseau, François Schiettekatte

*Corresponding author for this work

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Material Science

Engineering