The field of metasurfaces is rapidly growing. Nowadays, metasurfaces are considered at the front of artificial optical materials. With metasurfaces, it is possible to control the properties of light for variety of applications, from beam shaping, structural colors, and polarization control to tight focusing, scanning, spatial and spectral filtering, etc. One of the major challenges in the construction of metasurfaces is the need for precise control over their dimensions and consequently their spectral response. In this paper, we demonstrate an approach for postfabrication trimming of dielectric metasurfaces consisting of amorphous silicon layer on top of a quartz substrate, by using local oxidation of silicon technique. The oxidation effectively reduces the radius of the silicon disk, resulting in a blue shift in the observed spectral response. Blue shift of up to 100 nm is demonstrated. Relaxing fabrication tolerances and enabling post-processing techniques is expected to play an important role in promoting the scientific advances of metasurfaces into viable and useful technology. We thus believe that the demonstrated approach will provide an additional important tool to the rapidly developed toolkit of metasurface science and technology.
|Original language||American English|
|Journal||IEEE Journal of Selected Topics in Quantum Electronics|
|State||Published - 1 May 2019|
Bibliographical noteFunding Information:
Manuscript received August 16, 2018; revised December 22, 2018; accepted February 20, 2019. Date of publication March 4, 2019; date of current version March 28, 2019. This work was supported by the Israeli Ministry of Science and Technology. The work of J. Bar-David was supported by the Applied Science and Engineering Fellowship from the Israeli Ministry of Science and Technology. (Corresponding author: Uriel Levy.) The authors are with the Department of Applied Physics, Benin School of Engineering and Computer Science, Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 91904, Israel (e-mail:, firstname.lastname@example.org; email@example.com; ulevy@ mail.huji.ac.il).
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