TY - JOUR
T1 - Role of surface substances in excitation of porous silicon photoluminescence
AU - Khomenkova, Larisa Yu
AU - Baran, Nicolay P.
AU - Dzhumaev, Berdishukur R.
AU - Korsunskaya, Nadezhda E.
AU - Torchinskaya, Tatiana V.
AU - Goldstein, Yehuda
AU - Savir, Esther
AU - Many, Abraam
PY - 1999
Y1 - 1999
N2 - Photoluminescence (PL) and photoluminescence excitation (PLE) spectra studies as well as SIMS and FTIR methods were used for investigation of PL excitation mechanism of porous silicon (PS). It is shown that there are two types of PS PLE spectra, which consist of either two bands (visible and ultraviolet) or only ultraviolet one. The different dependencies of intensity of each PLE band upon anodization regimes as well as during aging and thermal treatment were observed. Two excitation channels have been shown to be present in PS. The visible PLE band at 300 K has been attributed to light absorption of some species on Si wire surface.
AB - Photoluminescence (PL) and photoluminescence excitation (PLE) spectra studies as well as SIMS and FTIR methods were used for investigation of PL excitation mechanism of porous silicon (PS). It is shown that there are two types of PS PLE spectra, which consist of either two bands (visible and ultraviolet) or only ultraviolet one. The different dependencies of intensity of each PLE band upon anodization regimes as well as during aging and thermal treatment were observed. Two excitation channels have been shown to be present in PS. The visible PLE band at 300 K has been attributed to light absorption of some species on Si wire surface.
UR - http://www.scopus.com/inward/record.url?scp=0032658592&partnerID=8YFLogxK
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AN - SCOPUS:0032658592
SN - 0277-786X
VL - 3725
SP - 111
EP - 115
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - Proceedings of the 1998 International Conference on Solid State Crystals, ICSSC'98 : Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology
Y2 - 12 October 1998 through 16 October 1998
ER -