Abstract
Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.
| Original language | English |
|---|---|
| Pages (from-to) | 746-748 |
| Number of pages | 3 |
| Journal | Optics Letters |
| Volume | 27 |
| Issue number | 9 |
| DOIs | |
| State | Published - 1 May 2002 |
| Externally published | Yes |