Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

A. Feigel*, Z. Kotler, Bruno Sfez

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.

Original languageAmerican English
Pages (from-to)746-748
Number of pages3
JournalOptics Letters
Volume27
Issue number9
DOIs
StatePublished - 1 May 2002
Externally publishedYes

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