Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

A. Feigel; Z. Kotler; Bruno Sfez

doi:10.1364/OL.27.000746

Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

A. Feigel^*
, Z. Kotler
, Bruno Sfez

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.

Original language	English
Pages (from-to)	746-748
Number of pages	3
Journal	Optics Letters
Volume	27
Issue number	9
DOIs	https://doi.org/10.1364/OL.27.000746
State	Published - 1 May 2002
Externally published	Yes

Access to Document

10.1364/OL.27.000746

Cite this

@article{f78adac4a22a4d918a83d8581bdc348f,

title = "Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals",

abstract = "Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.",

author = "A. Feigel and Z. Kotler and Bruno Sfez",

year = "2002",

month = may,

day = "1",

doi = "10.1364/OL.27.000746",

language = "אנגלית",

volume = "27",

pages = "746--748",

journal = "Optics Letters",

issn = "0146-9592",

publisher = "Optica Publishing Group (formerly OSA)",

number = "9",

}

TY - JOUR

T1 - Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

AU - Feigel, A.

AU - Kotler, Z.

AU - Sfez, Bruno

PY - 2002/5/1

Y1 - 2002/5/1

N2 - Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.

AB - Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-μrad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.

UR - https://www.scopus.com/pages/publications/0036574227

U2 - 10.1364/OL.27.000746

DO - 10.1364/OL.27.000746

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:0036574227

SN - 0146-9592

VL - 27

SP - 746

EP - 748

JO - Optics Letters

JF - Optics Letters

IS - 9

ER -

Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

Abstract

Access to Document

Other files and links

Fingerprint

Cite this