Semiconductor-Metal Nanofloret Hybrid Structures by Self-Processing Synthesis

Keyphrases

• Semiconductors 100%
• Self-referential Processing 100%
• Hybrid Structure 100%
• Hybrid Nanostructures 100%
• Plasmonic Enhancement 66%
• Metal Nanoshells 66%
• Semiconductor Nanowires 66%
• Processing Stages 33%
• Surfactant 33%
• Transmission Electron Microscopy 33%
• Nanostructures 33%
• Wet Chemical Method 33%
• Grass 33%
• Etching Process 33%
• Inductively Coupled Plasma Mass Spectrometry 33%
• Redox Potential 33%
• Mass Spectrometry Analysis 33%
• High Aspect Ratio 33%
• Deposition Process 33%
• Reducing Agent 33%
• Oxides 33%
• Deposited Metal 33%
• Directly Coupled 33%
• Metal Redox 33%
• Metal Deposition 33%
• Metal-semiconductor Junction 33%
• Process Termination 33%
• Chemical Vapor Deposition 33%
• Coinage Metals 33%
• Synthetic Methods 33%
• Grain Size 33%
• SiGe Nanowires 33%
• GeSn Alloy 33%
• Metal Grains 33%
• Thiophenol 33%
• Surface-enhanced Raman Scattering 33%
• Alloy Composition 33%
• Synthetic Strategies 33%
• Au-catalyzed 33%
• Tip Area 33%
• In Situ Scanning Transmission Electron Microscopy 33%
• Cu-Ag 33%
• Etchant Concentration 33%
• Crystalline Semiconductor 33%
• CuAu 33%

Material Science

• Nanostructure 100%
• Nanowire 75%
• Surface Active Agent 25%
• Oxide Compound 25%
• Monolayers 25%
• Transmission Electron Microscopy 25%
• Reducing Agent 25%
• Surface-Enhanced Raman Spectroscopy 25%
• Si-Ge Alloys 25%
• Scanning Transmission Electron Microscopy 25%
• Chemical Vapor Deposition 25%
• Metal-Semiconductor Junction 25%
• Inductively Coupled Plasma Mass Spectrometry 25%
• Mass Spectrometry 25%
• Grain Size 25%
• Metal Deposition 25%
• Phase Composition 25%

Chemical Engineering

• Nanostructure 100%
• Nanowire 75%
• Nanoshell 50%
• Surfactant 25%
• Vapor Deposition 25%
• Chemical Vapor Deposition 25%
• Inductively Coupled Plasma Mass Spectrometry 25%