Short-period surface superlattices formed by plasma etching

Y. Paltiel*, D. Mahalu, Hadas Shtrikman, G. Bunin, U. Meirav

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

We report the development of a process for fabricating etched surface superlattices (SSL). We utilize low-voltage electron cyclotron resonance plasma etching in conjunction with electron beam lithography to form a short-pitch grating relief on GaAs/AIGaAs heterostructures hosting a high-mobility two-dimensional electron gas (2DEG). The process minimizes damage to the 2DEG and results in highly uniform etched gratings. A Schottky gate covering the etched surface appears to improve the electrical properties of the SSLs. Magnetotransport measurements show the effectiveness of this technique in realizing high-quality SSLs with periods down to 100 nm.

Original languageAmerican English
Pages (from-to)987-990
Number of pages4
JournalSemiconductor Science and Technology
Volume12
Issue number8
DOIs
StatePublished - Aug 1997
Externally publishedYes

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