Skip to main navigation
Skip to search
Skip to main content
The Hebrew University of Jerusalem Home
Approve / Request updates on publications
Link opens in a new tab
Search content at The Hebrew University of Jerusalem
Home
Profiles
Research units
Research output
Prizes
Single-Step Grayscale Lithography of Multi-Depth Mie Void Metasurfaces
Oren Goldberg
*
, Noa Mazurski
,
Uriel Levy
*
Corresponding author for this work
The Institute of Applied Physics
Research output
:
Contribution to journal
›
Article
›
peer-review
3
Scopus citations
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Single-Step Grayscale Lithography of Multi-Depth Mie Void Metasurfaces'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Keyphrases
Metasurface
100%
Multi-depth
100%
Mie Void
100%
Grayscale Lithography
100%
Dielectric Metasurfaces
50%
Fabrication Methods
50%
Degrees of Freedom
25%
Robotics
25%
Spectral Tuning
25%
Visible Spectrum
25%
Virtual Reality
25%
Electron Beam
25%
Color Imaging
25%
Light Color
25%
Silicon Substrate
25%
Structured Light
25%
Spectral Measurement
25%
Multiple Depths
25%
Structural Color
25%
Depth Level
25%
Top-down Fabrication
25%
Binary Structure
25%
Geometrical Design
25%
Depth Control
25%
Spatially-varying
25%
Artistic Image
25%
Polarization Control
25%
Engineering
Lithography
100%
Metasurface
100%
Grayscale
100%
Dielectrics
40%
Potential Application
20%
Nanoscale
20%
Degree of Freedom
20%
Realization
20%
Silicon Substrate
20%
Virtual Reality
20%
Fabrication Approach
20%
Robotics
20%
Structural Color
20%
Physics
Metasurface
100%
Lithography
100%
Dielectric Material
40%
Nanoscale
20%
Degree of Freedom
20%
Electron Beam
20%
Structured Light
20%
Material Science
Lithography
100%
Metasurface
100%
Dielectric Material
40%
Poly Methyl Methacrylate
20%
Structural Color
20%
Silicon Substrate
20%