Size selectivity during dip coating of sol–gel silica-based antireflective coatings and its effect on the porosity of the coatings

Yair Tamar; Matan Kahanov; Carynelisa Haspel; Yoel Sasson

doi:10.1007/s11998-016-9825-1

Size selectivity during dip coating of sol–gel silica-based antireflective coatings and its effect on the porosity of the coatings

Yair Tamar^*, Matan Kahanov, Carynelisa Haspel, Yoel Sasson

^*Corresponding author for this work

Fredy & Nadine Herrmann Institute of Earth Sciences

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The behavior of the particle size distribution (PSD) during the preparation of sol–gel silica-based antireflective coatings (ARCs) by dip coating was examined. It was found that the PSD after deposition differs dramatically from the PSD in the sol–gel suspensions, with the PSD after deposition being much narrower. A correlation between a decrease in the porosity of the ARC and an increase in the dispersity of the deposited PSD was also found. Hence, controlling the PSD during deposition has a direct effect on the resulting porosity and thus on the reflectance of an ARC. It was found that the temperature and deposition speed during dip coating, respectively, have very little effect on the deposited PSD. It was found that the PSD of the sol–gel suspension control the content of the deposited PSD, but does not change the range of sizes deposited. Finally, it was found that random-uniform particle placement results in elongated sequences of four or more particles, which supports our previous conclusion that the linear permittivity mixing rule is most appropriate for Stöber-based ARCs.

Original language	American English
Pages (from-to)	1103-1113
Number of pages	11
Journal	Journal of Coatings Technology Research
Volume	13
Issue number	6
DOIs	https://doi.org/10.1007/s11998-016-9825-1
State	Published - 1 Nov 2016

Bibliographical note

Funding Information:
The authors would like to thank the Ring Family Foundation for their generous support of this research. Additionally, the authors would like to thank R. Tamar, J. Aronson, N. Zigdon, and J. Reis for their valuable advice. The Harvey M. Krueger Family Center for Nanoscience and Nanotechnology of the Hebrew University is acknowledged.

Funding Information:
Acknowledgments The authors would like to thank the Ring Family Foundation for their generous support of this research. Additionally, the authors would like to thank R. Tamar, J. Aronson, N. Zigdon, and J. Reis for their valuable advice. The Harvey M. Krueger Family Center for Nanoscience and Nanotechnology of the Hebrew University is acknowledged.

Publisher Copyright:
© 2016, American Coatings Association.

Keywords

Antireflective coating
Silica
Solar
Sol–gel
Thin-film

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10.1007/s11998-016-9825-1

Cite this

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title = "Size selectivity during dip coating of sol–gel silica-based antireflective coatings and its effect on the porosity of the coatings",

abstract = "The behavior of the particle size distribution (PSD) during the preparation of sol–gel silica-based antireflective coatings (ARCs) by dip coating was examined. It was found that the PSD after deposition differs dramatically from the PSD in the sol–gel suspensions, with the PSD after deposition being much narrower. A correlation between a decrease in the porosity of the ARC and an increase in the dispersity of the deposited PSD was also found. Hence, controlling the PSD during deposition has a direct effect on the resulting porosity and thus on the reflectance of an ARC. It was found that the temperature and deposition speed during dip coating, respectively, have very little effect on the deposited PSD. It was found that the PSD of the sol–gel suspension control the content of the deposited PSD, but does not change the range of sizes deposited. Finally, it was found that random-uniform particle placement results in elongated sequences of four or more particles, which supports our previous conclusion that the linear permittivity mixing rule is most appropriate for St{\"o}ber-based ARCs.",

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AU - Sasson, Yoel

N1 - Funding Information: The authors would like to thank the Ring Family Foundation for their generous support of this research. Additionally, the authors would like to thank R. Tamar, J. Aronson, N. Zigdon, and J. Reis for their valuable advice. The Harvey M. Krueger Family Center for Nanoscience and Nanotechnology of the Hebrew University is acknowledged. Funding Information: Acknowledgments The authors would like to thank the Ring Family Foundation for their generous support of this research. Additionally, the authors would like to thank R. Tamar, J. Aronson, N. Zigdon, and J. Reis for their valuable advice. The Harvey M. Krueger Family Center for Nanoscience and Nanotechnology of the Hebrew University is acknowledged. Publisher Copyright: © 2016, American Coatings Association.

PY - 2016/11/1

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N2 - The behavior of the particle size distribution (PSD) during the preparation of sol–gel silica-based antireflective coatings (ARCs) by dip coating was examined. It was found that the PSD after deposition differs dramatically from the PSD in the sol–gel suspensions, with the PSD after deposition being much narrower. A correlation between a decrease in the porosity of the ARC and an increase in the dispersity of the deposited PSD was also found. Hence, controlling the PSD during deposition has a direct effect on the resulting porosity and thus on the reflectance of an ARC. It was found that the temperature and deposition speed during dip coating, respectively, have very little effect on the deposited PSD. It was found that the PSD of the sol–gel suspension control the content of the deposited PSD, but does not change the range of sizes deposited. Finally, it was found that random-uniform particle placement results in elongated sequences of four or more particles, which supports our previous conclusion that the linear permittivity mixing rule is most appropriate for Stöber-based ARCs.

AB - The behavior of the particle size distribution (PSD) during the preparation of sol–gel silica-based antireflective coatings (ARCs) by dip coating was examined. It was found that the PSD after deposition differs dramatically from the PSD in the sol–gel suspensions, with the PSD after deposition being much narrower. A correlation between a decrease in the porosity of the ARC and an increase in the dispersity of the deposited PSD was also found. Hence, controlling the PSD during deposition has a direct effect on the resulting porosity and thus on the reflectance of an ARC. It was found that the temperature and deposition speed during dip coating, respectively, have very little effect on the deposited PSD. It was found that the PSD of the sol–gel suspension control the content of the deposited PSD, but does not change the range of sizes deposited. Finally, it was found that random-uniform particle placement results in elongated sequences of four or more particles, which supports our previous conclusion that the linear permittivity mixing rule is most appropriate for Stöber-based ARCs.

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KW - Silica

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Size selectivity during dip coating of sol–gel silica-based antireflective coatings and its effect on the porosity of the coatings

Abstract

Bibliographical note

Keywords

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