Spectral analysis of surfaces at subwavelength resolution

Raoul Kopelman*, Steven Smith, Weihong Tan, Renato Zenobi, Klony Lieberman, Aaron Lewis

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Scopus citations

Abstract

Near-field scanning optical microscopy has reached a resolution limit of 20 nm, which is about 1/30 of the wavelength employed. It can be used in reflection, transmission, fluorescence, etc., modes. Subwavelength luminescent light sources have been constructed, which can be used for both scanning optical and scanning exciton microscopy. The latter has a theoretical resolution limit equal or better than scanning tunneling microscopy. The major advantage of the optical and exciton scanning microscopies is their noninvasive nature, i.e., their application to nonconducting and soft surfaces. For instance, polymeric surfaces, Langmuir-Blodget films, and biological samples can be investigated in-situ, in air or water, and without radiation or otherwise induced damage. Luminescent or Raman active surface sites or molecules can be detected, in principle, with atomic or molecular resolution and, furthermore, characterized via single site luminescence or Raman spectra. The goal of this research is a fluorescence nanoscope that will have the capability to zoom- in nondestructively, in water, air, or vacuum, from the limits of resolution of lens-based confocal light microscopy (200 nm) to molecular dimensions of 1 nm.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherPubl by Int Soc for Optical Engineering
Pages33-40
Number of pages8
ISBN (Print)0819407836
StatePublished - 1992
Externally publishedYes
EventEnvironmental and Process Monitoring Technologies - Los Angeles, CA, USA
Duration: 20 Jan 199222 Jan 1992

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1637
ISSN (Print)0277-786X

Conference

ConferenceEnvironmental and Process Monitoring Technologies
CityLos Angeles, CA, USA
Period20/01/9222/01/92

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