State distribution and ambipolar diffusion length in n-type hydrogenated amorphous silicon

I. Balberg*, S. Z. Weisz

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Measurements of the deep state distribution and the ambipolar diffusion length were carried out on the same n-type a-Si:H materials. It was found that the concentration of active recombination centers [D-] is proportional to N1/2P, where NP is the total concentration of deep states. This result indicates that states other than D- states are present around the midgap of P-doped materials, and that the other states are probably associated with donor-D- pairs.

Original languageEnglish
Pages (from-to)215-218
Number of pages4
JournalJournal of Applied Physics
Volume66
Issue number1
DOIs
StatePublished - 1989

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