The effect of ground state population on the XeF laser performance

M. Rokni*, J. H. Jacob, J. C. Hsia, D. W. Trainor

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

In this letter we describe an investigation of the effect of the bound ground state of XeF on the laser performance. This was accomplished by observing the intensity of the sidelight fluorescence of the B (v′=0) →X (v\=3) as a function of laser flux at 353 nm. Our data indicate that the ground state dissociates more rapidly as the laser mixture temperature is increased from 300 to 500°K. As a result of the faster dissociation rate at 500°K, the XeF laser efficiency increases by ≈1.5 as the mixture temperature is increased from 300 to 500°K.

Original languageEnglish
Pages (from-to)243-245
Number of pages3
JournalApplied Physics Letters
Volume36
Issue number4
DOIs
StatePublished - 1980
Externally publishedYes

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