Abstract
Internal photoemission of charged carriers from metal to semiconductors plays an important role in diverse fields such as sub-bandgap photodetectors and catalysis. Typically, the quantum efficiency of this process is relatively low, posing a stringent limitation on its applicability. Here, we show that the efficiency of hot carrier injection from a metal into a semiconductor across a Schottky barrier can be enhanced by as much as an order of magnitude in the presence of surface roughness on the scale of a few atomic layers. Our results are obtained using a simple semianalytical theory and indicate that properly engineered plasmonic-assisted internal photoemission photodetectors can be a viable alternative in silicon photonics. Other applications, such as plasmonic-enhanced photocatalysis, can also benefit from these results.
Original language | English |
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Pages (from-to) | 4030-4036 |
Number of pages | 7 |
Journal | ACS Photonics |
Volume | 5 |
Issue number | 10 |
DOIs | |
State | Published - 17 Oct 2018 |
Bibliographical note
Publisher Copyright:© Copyright 2018 American Chemical Society.
Keywords
- Schottky barrier
- internal photoemission
- photodetectors
- plasmonics
- scattering
- surface enhancement