Thermal relaxation processes in Si1-xGex/Si quantum wells studied by inter-subband and inter-valence band spectroscopy

B. Adoram*, D. Krapf, M. Levy, R. Beserman, S. Thomas, K. L. Wang, J. Shappir, A. Sa'ar

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

In this paper we present a systematic experimental investigation of the optical properties associated with inter-subband and inter-valence band transitions in p-type pseudomorphic Si1-xGex/Si multiple quantum-wells structure under high-temperature thermal treatments. The structure exhibits two types of optical absorption lines: the first obeys the inter-subband selection rules and is assigned to heavy-hole transitions while the second obeys the inter-valence band selection rules and is assigned to transitions between a heavy hole and a mixed spin split off and light-hole state. Annealing treatments reveal two kinds of thermally activated processes. The first process is assigned to strain relaxation while the second is assigned to Si and Ge inter-diffusion. Raman spectroscopy provides additional support to our interpretation of the activation processes. We propose a quantitative model, based on the Bir-Pikus deformation potential to explain the experimental results.

Original languageEnglish
Pages (from-to)255-258
Number of pages4
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume7
Issue number1
DOIs
StatePublished - Apr 2000
EventThe 5th International Conference on Intersubband Transitions in Quantum Wells (ITQW '99) - Bad Ischl, Austria
Duration: 7 Sep 199911 Sep 1999

Bibliographical note

Funding Information:
This work was partially supported by grant #5877 of the Israeli Ministry of Science.

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