Abstract
3D photonic crystal fabrication was attempted using interference lithography together with high-refractive-index chalcogenide photoresists. The ∼750 nm feature size simple cubic WPC from As2S3 (n≈2.2) was optically characterized.
| Original language | English |
|---|---|
| Pages (from-to) | 4480-4482 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 83 |
| Issue number | 22 |
| DOIs | |
| State | Published - 1 Dec 2003 |
| Externally published | Yes |
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