TY - JOUR
T1 - Tuning the Electronic Properties of Silicon via Molecular Self-Assembly
AU - Zenou, Noemi
AU - Zelichenok, Alexander
AU - Yitzchaik, Shlomo
AU - Cohen, Rami
AU - Cahen, David
PY - 1998
Y1 - 1998
N2 - Control over the surface chemistry and physics of electronic and optical materials is essential for constructing devices and fine-tuning their performance. In the past few years we have started to explore the use of organic molecules for systematic modification of semiconductor surface electronic properties. In this paper, manipulation of silicon surfaces by self-assembly of various quinolinium-based chromophores is reported. The progress of the assembly process is monitored by XPS, UV-Vis, and FTIR spectroscopies as well as with surface wettability. The effect of the monolayer's dipole-moment on the Si surface potential and the interaction with surface states is monitored by CPD measurements. A pronounced effect of a sub-nanometer coupling-agent layer alone on the electron affinity and band-bending of Si was observed. We also show a way to modulate the Si work-function by tuning the dipole strength of the chromophore-containing organic, self-assembled monolayer and of its orientation with respect to the silicon surface.
AB - Control over the surface chemistry and physics of electronic and optical materials is essential for constructing devices and fine-tuning their performance. In the past few years we have started to explore the use of organic molecules for systematic modification of semiconductor surface electronic properties. In this paper, manipulation of silicon surfaces by self-assembly of various quinolinium-based chromophores is reported. The progress of the assembly process is monitored by XPS, UV-Vis, and FTIR spectroscopies as well as with surface wettability. The effect of the monolayer's dipole-moment on the Si surface potential and the interaction with surface states is monitored by CPD measurements. A pronounced effect of a sub-nanometer coupling-agent layer alone on the electron affinity and band-bending of Si was observed. We also show a way to modulate the Si work-function by tuning the dipole strength of the chromophore-containing organic, self-assembled monolayer and of its orientation with respect to the silicon surface.
UR - http://www.scopus.com/inward/record.url?scp=0346969885&partnerID=8YFLogxK
U2 - 10.1021/bk-1998-0695.ch005
DO - 10.1021/bk-1998-0695.ch005
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AN - SCOPUS:0346969885
SN - 0097-6156
VL - 695
SP - 57
EP - 66
JO - ACS Symposium Series
JF - ACS Symposium Series
ER -