Abstract
We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (5.3·10) silicon resonators, with nearly fully planar interface for multilayer silicon integration.
Original language | English |
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Title of host publication | 2015 Conference on Lasers and Electro-Optics, CLEO 2015 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 9781557529688 |
State | Published - 10 Aug 2015 |
Event | Conference on Lasers and Electro-Optics, CLEO 2015 - San Jose, United States Duration: 10 May 2015 → 15 May 2015 |
Publication series
Name | Conference on Lasers and Electro-Optics Europe - Technical Digest |
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Volume | 2015-August |
Conference
Conference | Conference on Lasers and Electro-Optics, CLEO 2015 |
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Country/Territory | United States |
City | San Jose |
Period | 10/05/15 → 15/05/15 |
Bibliographical note
Publisher Copyright:© 2015 OSA.
Keywords
- Fabrication
- Optical resonators
- Optical waveguides
- Photonics
- Q-factor
- Silicon
- Silicon nitride