Ultra-high Q silicon resonators in planarized LOCOS

Alex Naiman, Boris Desiatov, Liron Stern, Noa Mazurski, Joseph Shappir, Uriel Levy

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (5.3·10) silicon resonators, with nearly fully planar interface for multilayer silicon integration.

Original languageAmerican English
Title of host publication2015 Conference on Lasers and Electro-Optics, CLEO 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781557529688
StatePublished - 10 Aug 2015
EventConference on Lasers and Electro-Optics, CLEO 2015 - San Jose, United States
Duration: 10 May 201515 May 2015

Publication series

NameConference on Lasers and Electro-Optics Europe - Technical Digest


ConferenceConference on Lasers and Electro-Optics, CLEO 2015
Country/TerritoryUnited States
CitySan Jose

Bibliographical note

Publisher Copyright:
© 2015 OSA.


  • Fabrication
  • Optical resonators
  • Optical waveguides
  • Photonics
  • Q-factor
  • Silicon
  • Silicon nitride


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