Ultra-high Q silicon resonators in planarized LOCOS

Alex Naiman, Boris Desiatov, Liron Stern, Noa Mazurski, Joseph Shappir, Uriel Levy*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We describe a modified local oxidation of silicon process as a platform for the fabrication of waveguides and ultra-high Quality factor (6 5.3 106) silicon resonators, with nearly fully planar interface for multilayer silicon integration.

Original languageAmerican English
Title of host publicationCLEO
Subtitle of host publicationScience and Innovations, CLEO-SI 2015
PublisherOptical Society of America (OSA)
Pages2267
Number of pages1
ISBN (Electronic)9781557529688
DOIs
StatePublished - 4 May 2015
EventCLEO: Science and Innovations, CLEO-SI 2015 - San Jose, United States
Duration: 10 May 201515 May 2015

Publication series

NameCLEO: Science and Innovations, CLEO-SI 2015

Conference

ConferenceCLEO: Science and Innovations, CLEO-SI 2015
Country/TerritoryUnited States
CitySan Jose
Period10/05/1515/05/15

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