Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections

John P. Greene*, Michael C. Wiescher, Michael Paul

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

A method for the production of well adhering thin film layers of oxide compounds was developed at Argonne National Laboratory using a wide-beam saddle field ion beam source. These deposits were to be subsequently exposed to alpha particle beams at the University of Notre Dame and the Weizmann Institute for nuclear astrophysics studies involving low-energy alpha capture cross-section measurements. The deposits produced had to be uniform, adhere well to the cooled substrates used, and withstand the high dose irradiation. A description of the apparatus, production method, and some preliminary results will be presented.

Original languageEnglish
Pages (from-to)12-16
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume521
Issue number1
DOIs
StatePublished - 21 Mar 2004
EventAccelerator Target Technology for the 21st Century. Proceeding - Argonne, IL., United States
Duration: 4 Nov 20028 Nov 2002

Keywords

  • Focused sputtering
  • Large area target

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