Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections

John P. Greene; Michael C. Wiescher; Michael Paul

doi:10.1016/j.nima.2003.11.406

Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections

John P. Greene^*
, Michael C. Wiescher
, Michael Paul

^*Corresponding author for this work

Racah Institute of Physics

Research output: Contribution to journal › Conference article › peer-review

Abstract

A method for the production of well adhering thin film layers of oxide compounds was developed at Argonne National Laboratory using a wide-beam saddle field ion beam source. These deposits were to be subsequently exposed to alpha particle beams at the University of Notre Dame and the Weizmann Institute for nuclear astrophysics studies involving low-energy alpha capture cross-section measurements. The deposits produced had to be uniform, adhere well to the cooled substrates used, and withstand the high dose irradiation. A description of the apparatus, production method, and some preliminary results will be presented.

Original language	English
Pages (from-to)	12-16
Number of pages	5
Journal	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume	521
Issue number	1
DOIs	https://doi.org/10.1016/j.nima.2003.11.406
State	Published - 21 Mar 2004
Event	Accelerator Target Technology for the 21st Century. Proceeding - Argonne, IL., United States Duration: 4 Nov 2002 → 8 Nov 2002

Keywords

Focused sputtering
Large area target

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10.1016/j.nima.2003.11.406

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Greene, J. P., Wiescher, M. C., & Paul, M. (2004). Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 521(1), 12-16. https://doi.org/10.1016/j.nima.2003.11.406

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abstract = "A method for the production of well adhering thin film layers of oxide compounds was developed at Argonne National Laboratory using a wide-beam saddle field ion beam source. These deposits were to be subsequently exposed to alpha particle beams at the University of Notre Dame and the Weizmann Institute for nuclear astrophysics studies involving low-energy alpha capture cross-section measurements. The deposits produced had to be uniform, adhere well to the cooled substrates used, and withstand the high dose irradiation. A description of the apparatus, production method, and some preliminary results will be presented.",

keywords = "Focused sputtering, Large area target",

author = "Greene, \{John P.\} and Wiescher, \{Michael C.\} and Michael Paul",

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note = "Accelerator Target Technology for the 21st Century. Proceeding ; Conference date: 04-11-2002 Through 08-11-2002",

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Greene, JP, Wiescher, MC & Paul, M 2004, 'Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections', Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 521, no. 1, pp. 12-16. https://doi.org/10.1016/j.nima.2003.11.406

Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections. / Greene, John P.; Wiescher, Michael C.; Paul, Michael.
In: Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 521, No. 1, 21.03.2004, p. 12-16.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections

AU - Greene, John P.

AU - Wiescher, Michael C.

AU - Paul, Michael

PY - 2004/3/21

Y1 - 2004/3/21

N2 - A method for the production of well adhering thin film layers of oxide compounds was developed at Argonne National Laboratory using a wide-beam saddle field ion beam source. These deposits were to be subsequently exposed to alpha particle beams at the University of Notre Dame and the Weizmann Institute for nuclear astrophysics studies involving low-energy alpha capture cross-section measurements. The deposits produced had to be uniform, adhere well to the cooled substrates used, and withstand the high dose irradiation. A description of the apparatus, production method, and some preliminary results will be presented.

AB - A method for the production of well adhering thin film layers of oxide compounds was developed at Argonne National Laboratory using a wide-beam saddle field ion beam source. These deposits were to be subsequently exposed to alpha particle beams at the University of Notre Dame and the Weizmann Institute for nuclear astrophysics studies involving low-energy alpha capture cross-section measurements. The deposits produced had to be uniform, adhere well to the cooled substrates used, and withstand the high dose irradiation. A description of the apparatus, production method, and some preliminary results will be presented.

KW - Focused sputtering

KW - Large area target

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SN - 0168-9002

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EP - 16

JO - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

JF - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

IS - 1

T2 - Accelerator Target Technology for the 21st Century. Proceeding

Y2 - 4 November 2002 through 8 November 2002

ER -

Using a wide-beam ion source to produce large area sputtered films for low-energy laboratory studies of alpha capture cross-sections

Abstract

Keywords

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