Volumetric stability of two-step ionization dominated discharges

L. Friedland*, J. H. Jacob, J. A. Mangano

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The stability of self-sustained discharges is investigated both analytically and numerically. The dominant ionization mechanism in the discharge is assumed to be two-step ionization while both electron loss mechanisms attachment and recombination are considered. It is shown that the stiff voltage source is marginally stable when the electron loss rate is due solely to electron-molecular ion recombination. In the presence of attachment the stiff voltage source is unstable and the growth rate of the instability is approximately the attachment rate. A stiff current is shown to be more stable and the discharge is stable irrespective of the loss rate. The theory is verified numerically for at atmospheric Co2 laser discharge.

Original languageEnglish
Pages (from-to)3790-3797
Number of pages8
JournalJournal of Applied Physics
Volume65
Issue number10
DOIs
StatePublished - 1989
Externally publishedYes

Fingerprint

Dive into the research topics of 'Volumetric stability of two-step ionization dominated discharges'. Together they form a unique fingerprint.

Cite this