Abstract
Growth of metallic nano-clusters and control over their size are critically important for catalysis. Development of film patterning procedures at the nanometer scale has significant impact on future lithography. In this work, we present an approach to grow metallic nano-clusters and control their size using a weakly bound buffer layer as an intermediate substance and a template to control the clusters size at the range 1-15 nm. The buffer layer was further employed to create a pattern based on a selective laser ablation procedure. A thicker metallic film deposited on top of pre-patterned buffer layer has been demonstrated as a novel patterning technique at the sub-micron to nanometer scale employing a single laser pulse. The thermal stability of metallic structures prepared this way has been studied at temperature up to 1000 K.
Original language | English |
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Pages (from-to) | 6545-6549 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 253 |
Issue number | 15 |
DOIs | |
State | Published - 30 May 2007 |
Bibliographical note
Funding Information:This work was partially supported by a grant from the US-Israel Binational Science Foundation and the Israel Science Foundation. The support from The James Frack Program is acknowledged. The Farkas center is supported by the Bundesministerium fur Forschung und Technologie and the Minerva Gesellschaft fur die Forschung mbh.
Keywords
- Buffer layer
- Film laser-patterning
- Metallic nano-clusters