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Xe interacting with porous silicon
Assaf Paldor
, Gil Toker
, Yigal Lilach
,
Micha Asscher
*
*
Corresponding author for this work
Institute of Chemistry
Research output
:
Contribution to journal
›
Article
›
peer-review
8
Scopus citations
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Keyphrases
Porous Silicon
100%
Temperature Programmed Desorption
100%
Inner Pores
40%
Highly Sensitive
20%
Kinetic Model
20%
Adsorption Mechanism
20%
Xenon
20%
Non-destructive
20%
Governing Parameters
20%
Pore Diameter
20%
HRSEM
20%
Surface Area Measurement
20%
Surface Diffusion
20%
Desorption Curve
20%
Desorption Kinetics
20%
Wall Collision
20%
Double-peak Structure
20%
Diffusion Depth
20%
Pore Depth
20%
Assisted Adsorption
20%
Material Science
Desorption
100%
Porous Silicon
100%
Thin Films
16%
Scanning Electron Microscopy
16%
Xenon
16%
Surface Diffusion
16%
Surface (Surface Science)
16%
Chemical Engineering
Temperature Programmed Desorption
100%
Desorption
20%
Film
20%
Chemical Kinetics Characteristics
20%
Surface Diffusion
20%